Special offer - Delivery now £4.99 when ordered onlinePIE Scientific - technology-leading RF plasma etching/ashing/cleaning systems
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technology-leading RF plasma technology |
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EM-KLEEN - high performance plasma cleaner for SEM, FIB, XPS, SIMS and AES |
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Tergeo-EM TEM specimen/holder cleaner - downstream and immersion modes |
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Tergeo & Tergeo Plus - RF plasma reactors for etching, ashing and surface modification |
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advanced features, including plasma strength measurement |
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two-year warranty and specialist support |
Labtech is pleased to partner US-based Plasma Ion Electron Scientific (PIE Scientific) in the UK and Ireland. The company was founded by alumni of the Plasma & Ion Source Group of the prestigious Lawrence Berkeley National Laboratory – working alongside experienced engineers from the semiconductor and electron microscope manufacturing industries.
At the heart of the PIE Scientific range are innovative, technology-leading plasma cleaning systems. There are two product groups:
KLEEN series: compact, smart chamber-mounted downstream RF plasma cleaners
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Tergeo series: bench top RF plasma systems
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To learn more about the principles behind RF plasma cleaning for SEM, TEM and FIB specimens, holders and chambers see: EM cleaning.