Special offer - Delivery now £4.99 when ordered onlineSafematic CCU-010 HV high vacuum sputter coater
Fully automatic, high vacuum sputter coating
The Safematic CCU-010 HV sets new standards for high vacuum sputter coating and is suitable for both SEM and TEM sputtering applications with oxidising and non-oxidising metals - plus for thin film applications. The CCU-010 HV has impressive high vacuum performance which helps ensure coating quality that is optimal for both W-SEM and FE-SEM applications. A patented, plug-in-style sputtering head module delivers unsurpassed ease of use and servicing - with a carbon evaporation module available as a plug in option.
The glass vacuum chamber is 120mm in diameter and includes a handy vertical graduated scale for setting the height of the specimen stage. An implosion guard with safety monitoring is also fitted. There are specimen stage options to suit most applications and other options - including a wide range of sputtering targets and a simple upgrade to carbon evaporation.
CCU-010 HV sputter coater highlights
- Fully automatic, fine-grain sputtering for SEM
- Interchangeable, self-contained, plug-in style coating modules
- Integral, oil-free, high vacuum turbomolecular pumping
- Very small footprint (no external rotary pump and fittings required)
- SP-010 sputtering module option with active cooling - allows continuous running for up to 40 minutes
- High quality sputtering of oxidising and non-oxidising metal
- Dual-location quartz crystal film thickness measurement - fitted as standard
- Intuitive, touch-screen control - rapid data input, simple operation
- Large chamber option for coating specimens up to 6"/152mm
Sputter coating modules for high resolution SEM and thin film coating
The compact sputter coating modules (SP-010 and SP-011) conveniently include all the features required for the highest quality sputter coating - including magnetron, target, shutter, process pressure regulator, power electronics and cooling system. The high vacuum capabilities of the CCU-010 HV make it ideal for applications using both oxidising (e.g. Cr, Ir, W, ITO etc.) and non-oxidising (e.g. Au, Au/Pd, Pt etc.) metals. For some thin film coating applications where extended sputtering times are required, the SP-010 sputtering module has built-in cooling, which allows continuous coating runs of up to 50 minutes without any rest periods. For special processes requiring thicker films or very fast sputtering rates the high sputtering module (SP-011) is recommended.
Click here for detailed information: SP-010 and SP-011 sputter coating modules
Dual-position film thickness monitor - fitted as standard
A dual-position film thickness monitor (FTM) measurement system monitors and terminates the coating process at a user-defined thickness. The plug-in monitoring quartz crystal and holder can be moved between the centre of the specimen stage and the outside to accommodate different specimen sizes.
Integrated, oil-free, high vacuum pumping
The CCU-010 HV has a fully integrated Pfeiffer Hi Pace 80 turbomolecular backed by a compact Vacuubrand MD1 Vario-SP membrane pump . Fitted into the main console of the CCU-010 LV, this oil-free pumping system helps to deliver class-leading vacuum performance (to 2 x 10-6mbar) whilst considerably reducing the instrument’s footprint (35 x 55cm).
Rotating and rotary planetary specimen stages
The CCU-010 HV includes a static height and tilt angle adjustable plug-in style 80mm diameter specimen stage. For specimens requiring rotation the optional RS-010 rotation stage is available. For specimens with very irregular surfaces, or for particulates and spheres, the PS-006 rotary planetary stage is recommended.
ET-010 plasma cleaning accessory
The ET-010 plasma cleaning accessory is a fully integrated option for the Safematic CCU-010 sputter/carbon coater that is designed for the pre-treatment or post-treatment of specimens in combination with a coating process. SEM specimens can be pre-cleaned to remove light surface contamination prior to coating, without the need to breaking vacuum between plasma cleaning and sputtering processes. Additionally, TEM carbon films can be converted from hydrophobic to hydrophilic using an air plasma.
Click here for detailed information: ET-010 plasma cleaning accessory
Large chamber option for samples up to 6" (152mm) in diameter
The LC-006 is a large chamber option that replaces the standard glass chamber and allows specimens up to 6” (152mm) to be coated. The chamber is made of aluminium therefore does not require an implosion guard.
A sample holder for 6” wafers is included, other holders can be fitted.
The LC-006 can be retrofitted to existing CCU-010 coaters.
Coating LAB - full range of sputter coating data
Coating LAB is an option that gives easy access to coating and process data. The Windows-based software allows access to all the key data - pressure, current, voltage, coating rate, coating thickness and specimen temperature - as real-time curves. The coater is connected to a PC using an integrated USB interface, whilst the Coating LAB automatically establishes a connection to the coater. Password protected tools for configuring the system and updating the firmware are included. For more details see: Coating LAB.
RC-010 remote control software - full control of the CCU-010 from a glove box
RC-010 is Windows-based RC remote control software which allows the CCU-010 to be remotely controlled and monitored, for example from a glovebox. The graphical user interface allows easy set up and selection of recipes and comes ready with pre-defined recipes with optimal settings for the most common metal sputtering targets as well as carbon. Connection from a laptop or computer to the CCU-010 coating system is via a USB cable.
Minimum system requirements:
Windows 10, Windows 8.1, Windows 8, Windows 7 SP1, Windows Vista SP2, Pentium 366 MHz or higher, minimum 512MB of RAM, screen resolution 1024x768 or higher, USB 2.0 Interface
Brochure download: RC-010 .
HS-010 head module vacuum storage box
The HS-010 is a compact vacuum storage box which allows a second CCU-010 coating head for the CCU-010 module, additional planetary or rotary stage and the full range of sputtering targets and carbon thread clean and under vacuum when not in use.
For further information please see: HS-010 vacuum storage box.
To discover more about Safematic's unique coating modules see:
CT-010 carbon evaporation module
Selecting a coater
Need help selecting a coater, options and sputtering targets to suit your requirements? Then please see: coater selection guide.
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Ordering information
CCU-010 coating base unit
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 The Safematic CCU-010 HV vacuum coater is suitable for both SEM and TEM sputter coating and carbon coating applications. |
CCU-010 coating modules
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 Advanced, plug-in sputtering head module with built-in cooling for optimum performance (for very fast sputtering rates see: 100012) |
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 For applications requiring very fast sputtering rates |
Large chamber option for samples up to 6" (152mm) in diameter
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 The LC-006 is a large chamber option that replaces the standard glass chamber and allows specimens up to 6” (152mm) to be coated. The chamber is made of aluminium therefore does not require an implosion guard. The LC-006 includes a sample holder for 6” wafers, but other holders can be fitted. |
CCU-010 specimen stages and etching accessories
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 Plasma cleaning accessory for the Safematic CCU-010 sputter/carbon coater for the pre-treatment or after-treatment of specimens in combination with a coating process |
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 Height and angle adjustable 80mm diameter specimen stage with variable rotation. |
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 Microscope slide stage for Safematic CCU-010 coater, 76 x 26mm or one slide 76 x 52mm. Twelve M2 threaded holes for S-clips (not included see: 12-000900) |
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 For use with the PS-006 planetary gear stage.
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 Consisting of: base plate for connection to the tilt and height adjustable specimen table of the CCU-010 basic unit. Sample holders for six large (Ø 25.4mm) or six small (Ø12.7mm) SEM pin stubs. DC-micro motor for rotation and planetary movement, quartz sensor (centre), speed control: 0-100%, rotation: 0-20rpm approximately, planets: 0-65rpm approximately |
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 5 each EM-Tec copper alloy S-Clips with 5 each brass M2x3mm screws (pkg/5) |
CCU-010 Remote control software, Coating LAB and vacuum storage
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 Window-based software offering easy access to coating and process data: pressure, current, voltage, coating rate, coating thickness and specimen temperature |
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 A compact vacuum storage system for CCU-010 head modules and other accessories. Can be pumped by the coater or separate rotary pump (not supplied) |
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 Windows-based RC-010 remote control software allows Safematic CCU-010 coaters to be run remotely for the control, monitor and analyse of coating processes, for example, in a glove box. The graphical user interface facilitates the easy set up and selection of recipes. The RC-010 tool also comes ready with pre-defined recipes with optimal settings for the most common metal sputtering targets as well as carbon. |
Sputtering target - please select your preferred metal/metals
Gold sputter targets
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 Gold sputter coater target Ø 54 x 1.0mm thick, purity 99.99%, Au |
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Sputtering target, gold (Au) Ø 54 x 0.2mm purity 99.99% (each) |
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Gold sputter coater target, Ø54 x 0.1mm disc, 99.99% Au |
Gold palladium sputter targets
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 Sputtering target, gold/palladium 80/20 (Au/Pd) Ø 54 x 1.0mm purity 99.99% (each) |
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Sputter target gold palladium 70/30 (Au/Pd) Ø 54 x 1 mm purity 99.99% (each) |
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Sputter target gold palladium 60/40 (Au/Pd) Ø 54 x 1.0 mm purity 99.99% (each) |
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Gold/Palladium sputter coater target, Ø54 x 0.1mm disc, 60/40 Au/Pd, 99.99% Au/Pd |
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Gold/Palladium sputter coater target, Ø54 x 0.1mm disc, 80/20 Au/Pd, 99.99% Au/Pd |
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Gold/Palladium coater target, Ø54 x 0.2mm disc, 60/40 Au/Pd, 99.99% Au/Pd |
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Gold/Palladium sputter coater target, Ø54 x 0.2mm disc, 80/20 Au/Pd, 99.99% Au/Pd |
Platinum sputter targets
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 Sputtering target, platinum (Pt) Ø 54 x 0.2mm purity 99.95% (each) |
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Platinum coater target, Ø54 x 0.1mm disc, 99.99% Pt |
Iridium sputter targets
Iridium sputter coater target, Ø54 x 0.3mm disc, 99.99% Ir
Other sputter targets
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 Sputtering target, silver (Ag) Ø 54 x 1 mm purity 99.99% (each) |
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 Sputtering target, nickel (Ni) Ø 54 x 0.35 mm purity 99.99% (each) |
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 Sputtering target, tungsten (W) Ø 54 x 1 mm purity 99.95% (each) |
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 Sputtering target carbon (C) Ø 54 x 1.0mm purity 99.99% (each) |
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Sputtering target, aluminium (Al) Ø 54 x 1.0mm purity 99.99% (each) |
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Aluminium sputter coater target, Ø54 x 0.25mm disc, 99.999% Al |
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 Chromium sputtering target, dia. 54 x 0.5mm disc, 99.95% Cr |
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 Indium sputter coater target, dia.54 x 0.2mm disc, 99.99%, In (each) |
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 Indium sputter coater target, dia. 54 x 0.5mm disc, 99.99%, In (each) |
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 Palladium sputter coater target, Ø54 x 0.1mm disc, 99.99% Pd |
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 Tin sputtering target, dia.54 x 0.20mm disc, 99.99% Sn (each) |
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 Tantalum sputter coater target, dia. 54 x 0.20mm disc, 99.95% Ta (each) |
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 Sputtering target, Iron (Fe) Ø 54 x 0.35mm purity 99.9% (each) |
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 Indium Tin Oxide (ITO) sputter coater target 90/10 Ø 54 x 2.0mm purity 99.99% |
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 Sputter target, copper (Cu) Ø 54 x 1.0mm purity 99.99% (each) |
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 Sputtering target, titanium (Ti) Ø 54 x 0.2mm purity 99.99% (each) |
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 Sputtering target, platinum/iridium (Pt/Ir) Ø 54 x 1.0mm purity 99.95% (each) |
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 Sputtering target iridium (Ir) Ø 54 x 1.0mm purity 99.95% (each) |
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 Iridium sputter coater target, dia.54 x 0.1mm, disc, 99.99% Ir (each) |
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Iridium sputter coater target, Ø54 x 0.3mm disc, 99.99% Ir |
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 ITO (Indium Tin Oxide) sputter coater target, Ø54 x 3.0mm disc on 1mm thick copper backing plate. 90/10 Wt% In2O3/SnO2 - 99.99% (each) |
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Magnesium sputter target, dia. 54 x 0.1mm disc, 99.99% Mg (each) |
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 Sputtering target platinum/palladium (Pt/Pd) Ø 54 x 0.5mm purity 99.95% (each) |
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 Cobalt sputter coater target, dia. 54 x 0.1mm disc, 99.99% Co (each) |
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Cobalt sputter coater target, dia. 54 x 0.5mm disc, 99.99% Co |
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 Zinc sputtering target, dia.54 x 0.20mm disc, 99.5% Zn (each) |